High purity 4N Nickel Ni Sputtering Target for Metal Thin Film Coating

Introduction

 Thin film coating materials 99.99% Nickel sputtering target

Product Name	Nickel (Ni)sputtering target
Available Purity(%)	99.99(4N),99.995(4N5)
Shape	Planar, round
Size	as your request
Melting point(℃)	1453
Density(g/cm³)	8.9
Boiling point(℃)	2732
Technology	Vacuum Melting, Patented thermo-mechanical process and machine work
Application	Glass Coating & Decoration