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ZOPIN Sputtering Machine
2026-07-01
TMAX Battery Equipments | Est. 1995
Magnetron Sputtering System
Model: TMAX-BY-JS01
System Overview
The TMAX-BY-JS01 is a specialized low-temperature magnetron sputtering system engineered for high-precision coating workflows. It is highly optimized for preparing uniform conductive layers on non-conductive SEM samples and executing thin-film deposition on advanced temperature-sensitive materials.
Key Applications
✓SEM Imaging: Creates premium conductive coatings (Au, Ag, Pt, Pd) for non-conductive specimen preparation.
✓Heat-Sensitive Substrates: Maintains safe processing temperatures strictly below 60°C to secure material integrity.
✓Precision Deposition: Delivers high-quality thin film deposition with minimal thermal stress and superior uniformity.
Core Innovations
✓Rapid Depressurization: High-efficiency configuration achieves a 2 Pa vacuum state in less than 5 minutes to optimize operational throughput.
✓Advanced Cold Sputtering: Patented magnetic confinement engineering substantially eliminates substrate thermal exposure.
✓Glovebox Integration: Engineered with a versatile split-type structural design, enabling seamless installation within inert controlled environments (vacuum chamber interior / control console exterior).
Technical Specifications
| Parameter | Specifications & Details |
|---|---|
| Sputtering Configuration | DC Magnetron Sputtering |
| Vacuum Pump Assembly | High-Performance Rotary Vacuum Pump (Oil-sealed) |
| Pumping Velocity | 50 Hz: 8 m³/h (2.2 L/s) | 60 Hz: 9.6 m³/h (2.6 L/s) |
| Ultimate Vacuum Limit | 2 Pa |
| Operational Process Pressure | 8 Pa to 20 Pa |
| Evacuation Throughput | < 5 minutes (to reach baseline 2 Pa) |
| Vacuum Measurement Range | Atmospheric Pressure down to 2 × 10⁻² mbar |
| Chamber Architecture | Φ150 mm × 120 mm (H) | Ultra-hard High-transparency Quartz Glass |
| Sputtering Source Target | Standard Size: Φ50 mm × 0.1 mm (Au, Ag, Pt, etc.) |
| Peak Sputtering Current | 100 mA |
| Process Gas Control | Precision Needle Valve (Air Inlet) | Requires Argon (Ar) Gas Source |
| Power Supply Compliance | AC 220V 50Hz / AC 110V 60Hz Options |
| Physical Footprint & Weight | 360 mm (L) × 300 mm (W) × 380 mm (H) | Net Weight approx. 45 kg |
Installation Guide
1Connect the heavy-duty vacuum pump set securely to the main sputtering system.
2Fill the mechanical vacuum pump with premium grade pump oil to specified indicators.
3Attach the vacuum bellows and the oil mist filter onto the pump assembly utilizing the provided heavy clips.
4Connect the fully assembled flexible bellows tightly into the primary intake of the main unit.
5Initiate system activation by switching on the primary vacuum pump.
6Power on the main console unit to initialize system electronics.
Operation Guide
1Turn on the master system power switch.
2Configure the precise process timer countdown control (≤ 999 seconds).
3Slowly rotate the "LEAK" micro-valve knob to tune system internal pressure to the required target.
4Ensure the "SYSTEM" indicator red light changes state, confirming safe operating pressure thresholds.
5Provide a short momentary quick-press on the "SET PLASMA" button to preview current generation.
6Maintain sputtering current strictly under 100mA; adjust the rear physical VOLTAGE SWITCH if adjustment is necessary.
7Depress the "START" button to commence active thin-film plasma deposition.
8The system automatically terminates deposition at countdown end → safely turn power OFF.
Global Client Endorsements
TESLA APPROVED • MIT • GENERAL MOTORS • NASA • UNIVERSITY OF CAMBRIDGE • ANU • TDK • QinetiQ • NTU • UNIVERSITY OF OSLO
|
Manufacturer Xiamen Tmax Battery Equipments Limited Fujian, China |
Global Contact Phone: +86 18832681205 Email: david@tmaxcn.com |
Online Resource Website: https://www.tmaxcn.com/ |
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