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High Purity 99.5% Pure Boron Carbide B4C Ceramic Sputtering Target

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Boron Carbide Sputtering Target Boron Carbide Sputtering Target Boron Carbide Sputtering Target

High Purity 99.5% Pure Boron Carbide B4C Ceramic Sputtering Target

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High Purity 99.5% Pure Boron Carbide B4C Ceramic Sputtering Target

Introduction

The following table is a component analysis certificate for  2N5 B4C sputtering target. The analytical methods used are:
1. Analysis of metal elements using GDMS or ICP-OES;

2. Gas element analysis using LECO.

B4C Target




Boron carbide target


B4C Sputtering Target


Sputtering Target






tags : Boron Carbide Sputtering Target Purity 99.5% B4C Sputtering Target
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