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High Purity 99.9% 3N Pure Boron Sputtering Target

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Boron Sputtering Target Boron Sputtering Target Boron Sputtering Target

High Purity 99.9% 3N Pure Boron Sputtering Target

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product details

High Purity 99.9% 3N Pure Boron Sputtering Target

Introduction

The following table is a component analysis certificate for  3N Boron sputtering target. The analytical methods used are:
1. Analysis of metal elements using GDMS or ICP-OES;
2. Gas element analysis using LECO.


 B Target




B target


B target


B Target






tags : Boron Sputtering Target 99.9% 3N Pure Boron Sputtering Target
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