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High Purity 99.9% 3N High Purity V Coating Materials Vanadium Sputtering Target

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Vanadium Sputtering Target Vanadium Sputtering Target Vanadium Sputtering Target

High Purity 99.9% 3N High Purity V Coating Materials Vanadium Sputtering Target

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High Purity 99.9% 3N High Purity V Coating Materials Vanadium Sputtering Target

Introduction

Vanadium/V sputtering target
Available purity: 99.9%
Dimension: according to your request
Available shape: round, rectangular
Density: 6.11g/cm3
Melting point: 1890℃
Production method: electron beam melting
Certificate of analysis is available 

 





V Target






tags : Vanadium Sputtering Target High purity 99.9% Molybdenum Sputtering Target
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