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GaPmoq :
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The crystal structure of Gallium Phosphide(GaP) is a sphalerite type, which is an indirect transition type semiconductor. It is one of the main substrate materials for LEDs.
The Gallium Phosphide(GaP) epitaxial material is obtained by liquid-phase epitaxy or vapor-phase epitaxy and diffusion growth on a gallium phosphide single crystal substrate. The GaP is mostly used to manufacture light-emitting diodes. The GaP liquid-phase epitaxial material can produce red, green, yellow-green light-emitting diodes. And the GaP Vapor-phase epitaxial and diffusion-grown material can produce yellow, yellow-green light-emitting diodes.
|
Substrate material |
Single crystal Gallium Phosphide (GaP) |
|
Crystal structure |
Cubic a =5.4505 Å |
|
Growth method |
Czochralski (CZ) |
|
Density: |
4.13 g/cm3 |
|
Melting point: |
1480 ℃ |
|
Coefficient of thermal expansion: |
5.3 x10-6 |
|
Doping: |
S-doped/N-type; Undoped/N-type |
|
Thermal conductivity: |
2~8 x1017/cm3; 4~ 6 x1016/cm3 |
|
Resistivity (W.cm) |
~0.03; ~0.3 |
|
EPD (cm-2 ): |
< 3x10E5; < 3x10E5 |
|
Standard Orientation |
<111> or <100> |
|
Standard size |
10x10x0.5mm, Dia2"x0.5mm, Dia2"x0.28mm |
|
Polishing |
Single side polished or Double side polished |
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